Atomic deposition system(PE ALD)

Plasma enhanced atomic layer deposition system for R&D applications.

Applications:

- Thin film process for PEALD research

- Applications of R&D

- Very low price

- Various additional option

Features:

- PEALD thin films with good thickness uniformity and conformal step coverage

- Advanced process kit and minimized gas supply line length for short cycle times

- Direct plasma system

- Totally integrated process module

- Easy process control

- Load-lock system