Atomic deposition system(ALD)

Application:

-suitable for ultra-thin films for semiconductors (Al2O3, HfO2, ZrO2, TiO2, ZnO... ).

-Cadmium-free buffer layer deposition for CIGS solar cells.

-Deposition of passivation layer on the surface of crystalline silicon solar cell. -Barrier layer of silicon-based WVTR (water vapor transmittance).

-Micro-OLED encapsulation layer.

-Barrier layer for flexible substrate.

-OLED encapsulation layer.

-Roll-to-roll (R2R) ALD process for high moisture barrier films such as flexible OLED display, flexible OLED lighting, quantum dots, perovskite LED, flexible solar cells, etc.

-can be used for LTPO TFT IGZO thin film deposition.